1959 AD
Planar silicon process
Materials & manufacturing · Technology · Industry
Jean Hoerni developed a process that retained a silicon-dioxide layer on the wafer to protect p–n junctions. This passivation made transistor fabrication more reliable and created a material basis for higher-volume integrated-circuit production; it was not by itself the invention of the modern computer.
Precision, calendar, and review
- Start
- year · no uncertainty qualifier in this record
- Calendar and convention
- Historical-era years; the source calendar is not identified. No conversion of days is assumed.
- Year zero
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- Documentary review
- Date not recorded
Reading the date: point event.
Sources
- www.computerhistory.org (opens in a new tab)
Source provenance and scope
- Publication date
- Not identified in metadata; document review pending
- Bibliographic date checked
- 2026-09-23
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